(10.2) 1:45 -2:15 PM - GermaniumDeep-sub micron PMOS Transistors with Etched TaN Metal Gate on a High-K Dielectric, Fabricated in a 200mm Prototyping Line (Invited) | 東京工業大学附属図書館文献データベース

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(10.2) 1:45 -2:15 PM - GermaniumDeep-sub micron PMOS Transistors with Etched TaN Metal Gate on a High-K Dielectric, Fabricated in a 200mm Prototyping Line (Invited)

Author(s):

De Jaeger, M. Meuris B.

Van Steenbergen, J.

Van Elshocht, S.

Publication title:

SiGe: materials, processing, and devices : proceedings of the First international symposium

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

2004-07

Pub. Year:

2004

Page(from):

693

Page(to):

700

Pages:

8

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566774208 [1566774209]

Language:

English

Call no.:

E23400/200407

Type:

Conference Proceedings

Details

TDL ID:	ZA00015397
Series ID:	PA00000028
Conf. info. (Name):	SiGe: Materials, Processing, and Devices Symposium ; Meeting of the Electrochemical Society ; Fall Meeting of the Electrochemical Society of Japan
Conf. info. (Number):	1st ; 206th ; 2004
Conf. info. (Venue):	Honolulu, Hawaii, USA
Conf. info. (Date):	2004.10.03-2004.10.08

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