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Plasma-enhanced CVD of hard SiCN thin films using bistrimethyl silylcarbodiimide or hexamethyl disilazane as single source precursors

Author(s):
Publication title:
EUROCVD-15, fifteenth European Conference on Chemical Vapor Deposition : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2005-09
Pub. Year:
2005
Page(from):
1014
Page(to):
1020
Pages:
7
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774277 [1566774276]
Language:
English
Call no.:
E23400/200509
Type:
Conference Proceedings

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