Ultra-Low Thermal Budget CMOS Process for 65 nm-node Low-Operation-Power Applications (Invited paper)
- Author(s):
- Publication title:
- ULSI Process Integration : proceedings of the International Symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2005-06
- Pub. Year:
- 2005
- Page(from):
- 111
- Page(to):
- 117
- Pages:
- 7
- Pub. info.:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774642 [1566774640]
- Language:
- English
- Call no.:
- E23400/200506
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Performance of immersion lithography for 45-nm-node CMOS and ultra-high density SRAM with 0.25um2
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
8
Conference Proceedings
Design rule optimization for 65-nm-node (CMOS5) BEOL using process and layout decomposition methodology
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Wide temperature operation of 850-nm VCSEL and isolator-free operation of 1300-nm VCSEL for a variety of applications (Invited Paper)
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
31 New Materials, Processes and Device Structures for 65nm CMOS Technology Node and Beyond
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond (Invited Paper) [6283-130]
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Further Optimization of Plasma Nitridation of Ultra-thin Oxides for 65 nm 236 Node MOSFETs
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
A novel strategy of lithography-error-budget optimization for the 65-nm node: mask specifications for hyper-NA imaging [5992-35]
SPIE - The International Society of Optical Engineering |