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34 Improving CMOS performance by AVD〓 grown high-k dielectrics and advanced metal electrodes

Author(s):
Weber, U.
Boissiere, O.
Lindner, J.
Schumacher, M.
Lehnen, P.
Manke, C.
Van Elshocht, S.
Caymax, M.
Cosnier, V.
McEntee, T.
5 more
Publication title:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2005-05
Pub. Year:
2005
Page(from):
293
Page(to):
300
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774635 [1566774632]
Language:
English
Call no.:
E23400/200505
Type:
Conference Proceedings

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