28 Self-aligned PtSi Fully Silicided (FUST) Metal Gates for 45 nm CMOS Applications
- Author(s):
van Dal, M.J.H. Lauwers, A. Cunniffe, J. Verbeeck, R. Vrancken, C. Demeurisse, C. Dao, T. Tamminga, Y. Veloso, A. Kittl, J.A. Maex, K. - Publication title:
- Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2005-05
- Pub. Year:
- 2005
- Page(from):
- 233
- Page(to):
- 240
- Pages:
- 8
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774635 [1566774632]
- Language:
- English
- Call no.:
- E23400/200505
- Type:
- Conference Proceedings
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