Ryan C. Tappel, Christopher T. Nomura
American Chemical Society
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Rozzell,J.David
American Chemical Society
|
Christopher R. Mehrer, Nestor J. Hernandez-Lozada, Rung-Yi Lai, Brian F. Pfleger
American Institute of Chemical Engineers
|
Lee, S.Y., Hong, S.H.
American Chemical Society
|
Yi-Shu Tai, Mingyong Xiong, Kechun Zhang
American Institute of Chemical Engineers
|
Aram Kang, Wendy Chen, Susanna Su Jan Leong, Chi Bun Ching, Matthew Wook Chang
American Institute of Chemical Engineers
|
Ashby, Richard D., Solaiman, Daniel K. Y., Foglia, Thomas A.
American Chemical Society
|
Brady Cress, Robert J. Linhardt, Mattheos A.G. Koffas
American Institute of Chemical Engineers
|
Steinbuechel, Alexander
American Chemical Society
|
SelvaRupa Christinal Immanuel, Abhishek Gupta, Anu Raghunathan
American Institute of Chemical Engineers
|
Cong T. Trinh, Friedrich Srienc
American Institute of Chemical Engineers
|
Christine Nicole S. Santos, Gregory Stephanopoulos
American Institute of Chemical Engineers
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