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Growth of Silicon Suboxide Layer Above An Atomically Abrupt SiO2/Si(100) Interface in Conventional Furnace Oxynitridation Using N2O Ambients

Author(s):
Pennycook, Stephen J. ( Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN )
Browning, Nigel D. ( University of Illinois at Chicago, Chicago, IL )
Dang, SANJIT S. ( University of Illinois at Chicago, Chicago, IL )
Duscher, GERD ( University of Illinois at Chicago, Chicago, IL )
Rupangudi, Ramana V. ( University of Illinois at Chicago, Chicago, IL )
Takoudis, Christos G. ( University of Illinois at Chicago, Chicago, IL )
Trenary, Michael ( University of Illinois at Chicago, Chicago, IL )
2 more
Publication title:
AIChE 1998 ANNUAL MEETING
Title of ser.:
AIChE meeting [papers]
Ser. no.:
1998
Pub. Year:
1998
Paper no.:
103l
Pages:
2
Pub. info.:
New York: American Institute of Chemical Engineers
Language:
English
Call no.:
A08000
Type:
Conference Proceedings

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