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Homoepitaxial Growth of Si by Remote Plasma Chemical Vapor Deposition

Author(s):
  • Habermehl, S. ( North Carolina State University, Raleigh, NC )
  • Lucovsky, G. ( North Carolina State University, Raleigh, NC )
Publication title:
AIchE 1994 Annual Meeting : November 13-18 San Francisco Hilton and Towers Hotel, San Francisco, California
Title of ser.:
AIChE meeting [papers]
Ser. no.:
1994
Pub. Year:
1994
Paper no.:
18b
Pages:
6
Pub. info.:
New York: American Institute of Chemical Engineers
Language:
English
Call no.:
A08000/950031
Type:
Conference Proceedings

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