STOCHASTIC MODELING OF THERMAL OXIDATION OF SILICON

STOCHASTIC MODELING OF THERMAL OXIDATION OF SILICON

Author(s):

Chiu, Y. Y. ( Department of Chemical Engineering,Kansas State University )
Fan, L. T. ( Department of Chemical Engineering,Kansas State University )
Schlup, J. R. ( Department of Chemical Engineering,Kansas State University )
Chou, S. T. ( Department of Chemical Engineering,Kansas State University )
Shen, B. C. ( Department of Chemical Engineering,Kansas State University )

Publication title:

AIChE ANNUAL MEETING -LOS ANGELES, CA- NOVEMBER 17-22, 1991

Title of ser.:

AIChE meeting [papers]

Ser. no.:

1991

Pub. Year:

1991

Paper no.:

30d

Pages:

35

Pub. info.:

New York: American Institute of Chemical Engineers

Language:

English

Call no.:

A08000

Type:

Conference Proceedings

Details

TDL ID:	ZA00015150
Series ID:	PA00000179
Conf. info. (Name):	AIChE Annual Meeting
Conf. info. (Number):	1991
Conf. info. (Venue):	Los Angeles, CA, USA
Conf. info. (Date):	1991.11.17-1991.11.22
Note for article:	Fiche 5

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