Draelants, D. J., Zhao, H. -B., Baron, G. V.
Elsevier
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S.Y. Jeon, J.S. Yun, D.H. Son, C.H. Hwang, S.S. Hong, S.S. Park
Elsevier
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John N. Kuhn, Zhongkui Zhao, Umit S. Ozkan, Larry G. Felix, Rachid B. Slimane
American Institute of Chemical Engineers
|
Joesph Vutukuri, Prashanth Buchireddy, R. Mark Bricka, John Guillory, Rakesh Bajpai
American Institute of Chemical Engineers
|
Zhao, H. -B., Xiong, G. -X., Baron, G. V.
Elsevier
|
Joesph Vutukuri, Prashanth Buchireddy, R. Mark Bricka, John Guillory, Rakesh Bajpai
American Institute of Chemical Engineers
|
Sourabh S. Pansare, James G. Goodwin
American Institute of Chemical Engineers
|
Joesph Vutukuri, Prashanth Buchireddy, R. Mark Bricka, John Guillory, Rakesh Bajpai
American Institute of Chemical Engineers
|
J. Vutukuri, Prashanth Buchireddy, R. Mark Bricka, John Guillory, Rakesh Bajpai
American Institute of Chemical Engineers
|
Joesph Vutukuri, Prashanth Buchireddy, R. Mark Bricka, John Guillory, Rakesh Bajpai
American Institute of Chemical Engineers
|
Cao, G.Z., Brinkman, H.W., Meijerink, J., de Vries, K.J., Burggraaf, A.J.
Electrochemical Society
|
Joesph Vutukuri, Prashanth Buchireddy, R. Mark Bricka, John Guillory, Rakesh Bajpai
American Institute of Chemical Engineers
|