Production challenges of making EUV mask blanks
- Author(s):
Seitz, H. ( SCHOTT Lithotec AG (Germany) ) Sobel, F. ( SCHOTT Lithotec AG (Germany) ) Renno, M. ( SCHOTT Lithotec AG (Germany) ) Leutbecher, T. ( SCHOTT Lithotec AG (Germany) ) Olschewski, N. ( SCHOTT Lithotec AG (Germany) ) Reichardt, T. ( SCHOTT Lithotec AG (Germany) ) Walter, R. ( SCHOTT Lithotec AG (Germany) ) Becker, H. ( SCHOTT Lithotec AG (Germany) ) Buttgereit, U. ( SCHOTT Lithotec AG (Germany) ) HeB, G. ( SCHOTT Lithotec AG (Germany) ) Knapp, K. ( SCHOTT Lithotec AG (Germany) ) Wies, C. ( AIXUV GmbH (Germany) ) Lebert, R. ( AIXUV GmbH (Germany) ) - Publication title:
- EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5835
- Pub. Year:
- 2005
- Page(from):
- 244
- Page(to):
- 251
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458308 [0819458309]
- Language:
- English
- Call no.:
- P63600/5835
- Type:
- Conference Proceedings
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