Progress on EUV-source development, tool integration, and applications
- Author(s):
Lebert, R. ( AIXUV GmbH (Germany) ) Jagle, B. ( AIXUV GmbH (Germany) ) Wies, C. ( AIXUV GmbH (Germany) ) Stamm, U. ( XTREME technologies (Germany) ) Kleinschmidt, J. ( XTREME technologies (Germany) ) Gaebel, K. ( XTREME technologies (Germany) ) Schriever, G. ( XTREME technologies (Germany) ) Pankert, J. ( Philips EUV GmbH (Germany) ) Bergmann, K. ( Fraunhofer-Institut fur Lasertechnik (Germany) ) Neff, W. ( Fraunhofer-Institut fur Lasertechnik (Germany) ) Egbert, A. ( Phoenix EUV (Germany) ) - Publication title:
- EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5835
- Pub. Year:
- 2005
- Page(from):
- 230
- Page(to):
- 243
- Pages:
- 14
- Pub. info.:
- Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458308 [0819458309]
- Language:
- English
- Call no.:
- P63600/5835
- Type:
- Conference Proceedings
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