Demonstrators: a vital step forward for projection mask-less lithography (PML2)

Demonstrators: a vital step forward for projection mask-less lithography (PML2)

Author(s):

Brandstaetter, C. ( IMS Jena GmbH (Germany) )

Haugeneder, E. ( IMS Jena GmbH (Germany) )

Doering, H.-J. ( Leica Microsystems Lithography GmbH (Germany) )

Elster, T. ( Leica Microsystems Lithography GmbH (Germany) )

Heinitz, J. ( Leica Microsystems Lithography GmbH (Germany) )

Fortagne, O. ( Leica Microsystems Lithography GmbH (Germany) )

Eder-Kapl, S. ( IMS Nanofabrication GmbH (Austria) )

Lammer, G. ( IMS Nanofabrication GmbH (Austria) )

Jochl, P. ( IMS Nanofabrication GmbH (Austria) )

Loeschner, H. ( IMS Nanofabrication GmbH (Austria) )

Reimer, K. ( Fraunhofer Institute for Silicon Technology (Germany) )

Saniter, J. ( Fraunhofer Heinrich Hertz Institute (Germany) )

Talmi, M. ( Fraunhofer Heinrich Hertz Institute (Germany) )

Eberhardt, R. ( Fraunhofer Institute for Optics and Precision Engineering (Germany) )

Kroenert, K. ( Equicon GmbH (Germany) )

10 more

Publication title:

EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5835

Pub. Year:

2005

Page(from):

188

Page(to):

195

Pages:

8

Pub. info.:

Bellingham, Wash.,: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819458308 [0819458309]

Language:

English

Call no.:

P63600/5835

Type:

Conference Proceedings

Details

TDL ID:	ZA00015067
Series ID:	PA00000029
Conf. info. (Name):	EMLC : European Mask and Lithography Conference
Conf. info. (Number):	2005 : 21st
Conf. info. (Venue):	Dresden, Germany
Conf. info. (Date):	2005.01.31-2005.02.03

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