Application data of the electron beam based photomask repair tool MeRiT MG
- Author(s):
- Ehrlich, C. ( Carl Zeiss SMS GmbH (Germany) )
- Edinger, K. ( NaWoTec GmbH (Germany) )
- Boegli, V. ( NaWoTec GmbH (Germany) )
- Kuschnerus, P. ( Carl Zeiss NTS GmbH (Germany) )
- Publication title:
- EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5835
- Pub. Year:
- 2005
- Page(from):
- 145
- Page(to):
- 154
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458308 [0819458309]
- Language:
- English
- Call no.:
- P63600/5835
- Type:
- Conference Proceedings
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