Actual measurement data obtained on new 65nm generation mask metrology toot set

Actual measurement data obtained on new 65nm generation mask metrology toot set

Author(s):

Bender, J. ( Leica Microsystems Semiconductor GmbH (Germany) )

Ferber, M. ( Leica Microsystems Semiconductor GmbH (Germany) )

Roth, K.-D. ( Leica Microsystems Semiconductor GmbH (Germany) )

Schluter, G. ( Leica Microsystems Semiconductor GmbH (Germany) )

Steinberg, W. ( Leica Microsystems Semiconductor GmbH (Germany) )

Scheuring, G. ( MueTec GmbH (Germany) )

Hillmann, F. ( MueTec GmbH (Germany) )

2 more

Publication title:

EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5835

Pub. Year:

2005

Page(from):

134

Page(to):

144

Pages:

11

Pub. info.:

Bellingham, Wash.,: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819458308 [0819458309]

Language:

English

Call no.:

P63600/5835

Type:

Conference Proceedings

Details

TDL ID:	ZA00015067
Series ID:	PA00000029
Conf. info. (Name):	EMLC : European Mask and Lithography Conference
Conf. info. (Number):	2005 : 21st
Conf. info. (Venue):	Dresden, Germany
Conf. info. (Date):	2005.01.31-2005.02.03

Similar Items:

1 Conference Proceedings Results of a round robin measurement on a new CD mask standard Gans, F., Liebe, R., Richter, J., Schatz, Th., Hauffe, B., Hillmann, F., Dobereiner, S., Bruck, H.-J., Scheuring, G., … SPIE - The International Society of Optical Engineering	7 Conference Proceedings New results from DUV water immersion microscopy using the CD metrology system LWM500 WI with a high NA condenser F. Hillmann, G. Scheuring, H.-J. Brück Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings DUV water immersion technology extends linearity: first results from the new 65nm node CD metrology system LWM500 WI Hillmann, F., Dobereiner, S., Gittinger, C., Reiter, R., Falk, G., Bruck, H.-J., Scheuring, G., Bosser, A., Heiden, M., … SPIE - The International Society of Optical Engineering	8 Conference Proceedings Performance data obtained on a next-generation mask metrology tool Roth,K.-D., Blasing-Bangert,C. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Performance data obtained on a new mask metrology tool Roth,K.-D., Blasing-Bangert,C., Whittey,J.M. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Implementation of 248-nm based CD metrology for advanced reticle production Hourd, A.C., Grimshaw, A., Scheuring, G., Gittinger, C., Doebereiner, S., Hillmann, F., Brueck, H.-J., Hartmann, H., … SPIE-The International Society for Optical Engineering
4 Conference Proceedings Actual performance data obtained on new transmitted light mask metrology system Roeth, K.-D., Schlueter, G. SPIE-The International Society for Optical Engineering	10 Conference Proceedings New approach for defect inspection on large area masks G. Scheuring, S. Doebereiner, F. Hillmann, G. Falk, H. Brueck SPIE - The International Society of Optical Engineering
5 Conference Proceedings Next-generation mask metrology tool Schlueter, G., Roeth, K.-D., Blaesing-Bangert, C., Ferber, M. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec (M5k) DUV tool Scheuring, G., Petrashenko, A., Doebereiner, S., Hillmann, F., Brucek, H.-J., Hourd, A.C., Grimshaw, A., Hughes, G., … SPIE-The International Society for Optical Engineering
6 Conference Proceedings First results from a new 248-nm CD measurement system for future mask and reticle generation Schluter,G., Scheuring,G., Helbing,J., Lehnigk,S., Bruck,H.-J. SPIE-The International Society for Optical Engineering	12 Conference Proceedings First performance data obtained on next-generation mask metrology tool Schlueter,G., Roeth,K.-D., Whittey,J. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12