Results of a round robin measurement on a new CD mask standard

Results of a round robin measurement on a new CD mask standard

Author(s):

Gans, F. ( Advanced Mask Technology Ctr. (Germany) )

Liebe, R. ( Advanced Mask Technology Ctr. (Germany) )

Richter, J. ( Advanced Mask Technology Ctr. (Germany) )

Schatz, Th. ( Infineon Technologies AG (Germany) )

Hauffe, B. ( Photronics MZD GmbH and Co. KG (Germany) )

Hillmann, F. ( MueTec GmbH (Germany) )

Dobereiner, S. ( MueTec GmbH (Germany) )

Bruck, H.-J. ( MueTec GmbH (Germany) )

Scheuring, G. ( MueTec GmbH (Germany) )

Brendel, B. ( Leica Microsystems Lithography GmbH (Germany) )

Bettin, L. ( Leica Microsystems Lithography GmbH (Germany) )

Roth, K.-D. ( Leica Microsystems Wetzlar GmbH (Germany) )

Steinberg, W. ( Leica Microsystems Wetzlar GmbH (Germany) )

Schluter, G. ( Leica Microsystems Wetzlar GmbH (Germany) )

Speckbacher, P. ( Dr. Johannes Heidenhain GmbH (Germany) )

Sedlmeier, W. ( Dr. Johannes Heidenhain GmbH (Germany) )

Scherubl, T. ( Carl Zeiss SMS GmbH (Germany) )

HaBler-Grohne, W. ( Physikalisch-Technische Bundesanstalt (Germany) )

Frase, C. G. ( Physikalisch-Technische Bundesanstalt (Germany) )

Czerkas, S. ( Physikalisch-Technische Bundesanstalt (Germany) )

Dirscherl, K. ( Physikalisch-Technische Bundesanstalt (Germany) )

Bodermann, B. ( Physikalisch-Technische Bundesanstalt (Germany) )

Mirande, W. ( Physikalisch-Technische Bundesanstalt (Germany) )

Bosse, H. ( Physikalisch-Technische Bundesanstalt (Germany) )

19 more

Publication title:

EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5835

Pub. Year:

2005

Page(from):

122

Page(to):

133

Pages:

12

Pub. info.:

Bellingham, Wash.,: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819458308 [0819458309]

Language:

English

Call no.:

P63600/5835

Type:

Conference Proceedings

Details

TDL ID:	ZA00015067
Series ID:	PA00000029
Conf. info. (Name):	EMLC : European Mask and Lithography Conference
Conf. info. (Number):	2005 : 21st
Conf. info. (Venue):	Dresden, Germany
Conf. info. (Date):	2005.01.31-2005.02.03

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