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Application results at 193nm: lithography emulation by aerial imaging and supplementary high resolution measurements

Author(s):
Publication title:
EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5835
Pub. Year:
2005
Page(from):
115
Page(to):
121
Pages:
7
Pub. info.:
Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458308 [0819458309]
Language:
English
Call no.:
P63600/5835
Type:
Conference Proceedings

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