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Photo-etching of organic polymers using a laser plasma x-ray source based on a gas puff target irradiated with the PALS facility

Author(s):
Fiedorowicz, H. ( Military Univ. of Technology (Poland) )
Bartnik, A. ( Military Univ. of Technology (Poland) )
Bittner, M. ( Institute of Physics (Czech Republic) and Institute of Plasma Physics (Czech Republic) )
Juha, L. ( Institute of Physics (Czech Republic) and Institute of Plasma Physics (Czech Republic) )
Krasa, J. ( Institute of Physics (Czech Republic) and Institute of Plasma Physics (Czech Republic) )
Kubat, P. ( Institute of Physics (Czech Republic), Institute of Plasma Physics (Czech Republic) and Institute of Physical Chemistry (Czech Republic) )
Mikolajczyk, J. ( Military Univ. of Technology (Poland) )
Rakowski, R. ( Military Univ. of Technology (Poland) )
3 more
Publication title:
XV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5777
Pub. Year:
2005
Page(from):
970
Page(to):
973
Pages:
4
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457608 [0819457604]
Language:
English
Call no.:
P63600/5777-2
Type:
Conference Proceedings

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