Real-time control of photoresist absorption coefficient uniformity

Real-time control of photoresist absorption coefficient uniformity

Author(s):

Tay, A. ( National Univ. of Singapore(Singapore) )
Ho, W. -K. ( National Univ. of Singapore(Singapore) )
Wu, X. ( National Univ. of Singapore(Singapore) )
Tsai, K. -Y. ( Intel Corp. (USA) )

Publication title:

Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5755

Pub. Year:

2005

Page(from):

187

Page(to):

195

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457356 [0819457353]

Language:

English

Call no.:

P63600/5755

Type:

Conference Proceedings

Details

TDL ID:	ZA00014982
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2005 : 2nd
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2005.03.03-2005.03.04

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