Etch, reticle, and track CD fingerprint corrections with local dose compensation
- Author(s):
van der Laan, H. ( ASML(Netherlands) ) Carpaij, R. ( ASML(Netherlands) ) Krist, J. ( ASML(Netherlands) ) Noordman, O. ( ASML(Netherlands) ) van Dommelen, Y. ( ASML(Netherlands) ) van Schoot, J. ( ASML(Netherlands) ) Blok, F. ( ASML(Netherlands) ) van Os, C. ( ASML(Netherlands) ) Stegeman, S. ( ASML(Netherlands) ) Hoogenboom, T. ( ASML(Netherlands) ) Hickman, C. ( Micron Technology, Inc. (USA) ) Byers, E. ( Micron Technology, Inc. (USA) ) Gugel, T. ( Micron Technology, Inc. (USA) ) - Publication title:
- Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5755
- Pub. Year:
- 2005
- Page(from):
- 107
- Page(to):
- 118
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457356 [0819457353]
- Language:
- English
- Call no.:
- P63600/5755
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
2
Conference Proceedings
Reticle error correction for lithography tool qualification benefits and limitations
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Compensating measured intra-wafer ring oscillator stage delay with intra-wafer exposure dose corrections [6152-71]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
5
Conference Proceedings
Understanding systematic and random CD variations using predictive modeling techniques
SPIE - The International Society for Optical Engineering |
11
Conference Proceedings
CD uniformity improvement by loading effect correction (LEC) function for 90-nm reticle
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Global CD uniformity improvement using dose modulation and pattern correction of pattern density-dependent and position-dependent errors
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Electron beam lithography time dependent dose correction for reticle CD uniformity enhancement [6283-05]
SPIE - The International Society of Optical Engineering |