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The analysis of the criteria of phase error by evaluating the influence of lens aberration on the lithographic performance

Author(s):
  • Jeong, C.-Y. ( MagnaChip Semiconductor Ltd. (South Korea) )
  • Ahn, J.-K. ( MagnaChip Semiconductor Ltd. (South Korea) )
  • Park, K.-Y. ( MagnaChip Semiconductor Ltd. (South Korea) )
  • Choi, J. S. ( MagnaChip Semiconductor Ltd. (South Korea) )
  • Lee, J. G. ( MagnaChip Semiconductor Ltd. (South Korea) )
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. Year:
2005
Pt.:
3
Page(from):
1681
Page(to):
1692
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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