The effect of polarized 193nm irradiation on photomask haze formation
- Author(s):
Kim, Y. D. ( Photronics (South Korea) ) Kang, H. B. ( Photronics (South Korea) ) Zhang, Y. ( Photronics, Inc. (USA) ) Tran, C. ( Cymer Inc. (USA) ) Farrar, N. ( Cymer Inc. (USA) ) Qin, J. ( Photronics (USA) ) Rockwell, B. ( Photronics (USA) ) Cho, H. J. ( Photronics (South Korea) ) Cottle, R. ( Photronics (USA) ) Chan, D. ( Photronics (USA) ) Martin, P. ( Photronics (USA) ) Choi, S. S. ( Photronics (South Korea) ) Progler, C. ( Photronics (USA) ) - Publication title:
- Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5754
- Pub. Year:
- 2005
- Pt.:
- 3
- Page(from):
- 1586
- Page(to):
- 1590
- Pages:
- 5
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457349 [0819457345]
- Language:
- English
- Call no.:
- P63600/5754
- Type:
- Conference Proceedings
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