The impact of illumination on feature fidelity for CPL mask technology
- Author(s):
Kuijten, J. P. ( ASML (Netherlands) ) Verhappen, A. ( ASML (Netherlands) ) Conley, W. ( Freescale Semiconductor (USA) ) van de Goor, S. ( ASML (Netherlands) ) Litt, L. ( Freescale Semiconductor (USA) ) Wu, W. ( Freescale Semiconductor (USA) ) Lucas, K. ( Freescale Semiconductor (USA) ) Roman, B. ( Freescale Semiconductor (USA) ) Kasprowicz, B. ( Photronics (USA) ) Progler, C. ( Photronics (USA) ) Socha, R. ( ASML MaskTools (USA) ) van den Broeke, D. ( ASML MaskTools (USA) ) Wampler, K. ( ASML MaskTools (USA) ) Laidig, T. ( ASML MaskTools (USA) ) Hsu, S. ( ASML MaskTools (USA) ) - Publication title:
- Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5754
- Pub. Year:
- 2005
- Pt.:
- 3
- Page(from):
- 1557
- Page(to):
- 1561
- Pages:
- 5
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457349 [0819457345]
- Language:
- English
- Call no.:
- P63600/5754
- Type:
- Conference Proceedings
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