Applications of CPL mask technology for sub-65nm gate imaging
- Author(s):
Litt, L. C. ( Freescale Semiconductor (USA) ) Conley, W. ( Freescale Semiconductor (USA) ) Wu, W. ( Freescale Semiconductor (USA) ) Peters, R. ( Freescale Semiconductor (USA) ) Parker, C. ( Freescale Semiconductor (USA) ) Cobb, J. ( Freescale Semiconductor (USA) ) Kasprowicz, B. S. ( Photronics (USA) ) van den Broeke, D. ( ASML USA) and ASML MaskTools, Inc. (USA) ) Park, J. C. ( ASML USA) and ASML MaskTools, Inc. (USA) ) Karur-Shanmugam, R. ( Univ. of Texas af Dallas (USA) ) - Publication title:
- Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5754
- Pub. Year:
- 2005
- Pt.:
- 3
- Page(from):
- 1459
- Page(to):
- 1468
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457349 [0819457345]
- Language:
- English
- Call no.:
- P63600/5754
- Type:
- Conference Proceedings
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