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Super diffraction lithography (SDL): fine random line pattern formation by single-exposure with binary mask

Author(s):
Nakao, S. ( Renesas Technology (Japan) )
Abe, J. ( Renesas Technology (Japan) )
Nakae, A. ( Renesas Technology (Japan) )
Imai, A. ( Renesas Technology (Japan) )
Narimatsu, K. ( Renesas Technology (Japan) )
Suko, K. ( Renesas Technology (Japan) )
1 more
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. Year:
2005
Pt.:
3
Page(from):
1449
Page(to):
1458
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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