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A novel assist feature for contact holes to overcome problematic pitches

Author(s):
Yang, M. ( Macronix International Co. Ltd. (Taiwan) )
Lin, F. ( Macronix International Co. Ltd. (Taiwan) )
Yang, E. ( Macronix International Co. Ltd. (Taiwan) )
Yang, T. H. ( Macronix International Co. Ltd. (Taiwan) )
Chen, K. C. ( Macronix International Co. Ltd. (Taiwan) )
Ku, J. ( Macronix International Co. Ltd. (Taiwan) )
Lu, C. Y. ( Macronix International Co. Ltd. (Taiwan) )
2 more
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. Year:
2005
Pt.:
3
Page(from):
1437
Page(to):
1448
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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