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Imaging study of positive and negative tone weak phase-shifted 65 nm node contacts

Author(s):
Beach, J. V. ( ATDF (USA) )
Pefersen, J. S. ( Petersen Advanced Lifhography (USA) )
Greenway, R. T. ( Petersen Advanced Lifhography (USA) )
Maslow, M. J. ( Petersen Advanced Lifhography (USA) )
MacDonald, S. S. ( DuPont Photomasks, Inc. (USA) )
Margolis, L. H. ( DuPont Photomasks, Inc. (USA) )
Hughes, G. P. ( DuPont Photomasks, Inc. (USA) )
2 more
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. Year:
2005
Pt.:
3
Page(from):
1355
Page(to):
1366
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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