Determination of mask induced polarization effects occurring in hyper NA immersion lithography
- Author(s):
Huang, W. C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lai, C. M. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Luo, B. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Tsai, C. K. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Tsay, C. S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lai, C. W. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Kuo, C. C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Liu, R. G. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lin, H. T. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lin, B. J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) - Publication title:
- Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5754
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 543
- Page(to):
- 554
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457349 [0819457345]
- Language:
- English
- Call no.:
- P63600/5754
- Type:
- Conference Proceedings
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