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Determination of mask induced polarization effects occurring in hyper NA immersion lithography

Author(s):
Huang, W. C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lai, C. M. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Luo, B. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Tsai, C. K. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Tsay, C. S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lai, C. W. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Kuo, C. C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Liu, R. G. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lin, H. T. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lin, B. J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
5 more
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. Year:
2005
Pt.:
1
Page(from):
543
Page(to):
554
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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