Blank Cover Image

The impact of mask topography on binary reticles at the 65nm node

Author(s):
Word, J. ( Mentor Graphics Corp. (USA) )
Belledent, J. ( Philips Semiconductors (France) )
Trouiller, Y. ( STMicroelectronics (France) )
Granik, Y. ( STMicroelectronics (France) )
Toublan, O. ( Mentor Graphics Corp. (USA) )
Maurer, W. ( Infineon Technologies (Germany) )
1 more
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. Year:
2005
Pt.:
1
Page(from):
527
Page(to):
536
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Reticle enhancement verification for the 65nm and 45nm nodes [6156-58]

Lucas, K., Patterson, K., Boone, R., Miramond, C., Borjon, A., Belledent, J., Toublan, O., Entradas, J., Trouiller, Y.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Full chip model based correction of flare-induced linewidth variation

James Word, Jerome Belledent, Yorick Trouiller, Yuri Granik, Olivier Toublan, Wilhelm Maurer

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Full-chip-model-based correction of flare-induced linewidth variation

Word, J., Belledent, J., Trouiller, Y., Maurer, W., Granik, Y., Sahouria, E., Toublan, O.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Alternatives to alternating phase-shift masks for 65 nm

Torres, J.A., Maurer, W.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings The impact of mask topography on binary reticles at the 65-nm node

Smith, M. D., Byers, J. D., Mack, C. A.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Modeling of electromagnetic effects from mask topography at full-chip scale

Borjon, A., Belledent, J., Shang, S. D., Toublan, O., Miramond, C., Patterson, K., Lucas, K., Couderc, C., Rody, Y., …

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Critical failure ORC: application to the 90-nm and 65-nm nodes

Belledent, J., Shang, S.D., Trouiller, Y., Miramond, C., Patterson, K., Toublan, O.R., Couderc, C., Sundermann, F., …

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Extending immersion lithography to the 32-nm node

S. Warrick, W. Conley, V. Farys, M. Benndorf, J. Gemmink, Y. Trouiller, J. Belledent, D. Jovanovic, P. Gouraud

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Correction of long-range effects applied to the 65-nm node [5853-107]

Belledent, J., Word, J., Trouiller, Y., Couderc, C., Miramond, C., Toublan, O., Chapon, J.-D., Baron, S., Borjon, A., …

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Improving model-based OPC performance for the 65-nm node through calibration set optimization

Patterson, K., Trouiller, Y., Lucas, K., Belledent, J., Borjon, A., Rody, Y., Couderc, C., Sundermann, F., Urbani, J. …

SPIE - The International Society of Optical Engineering
6 Conference Proceedings 3D mask modeling with oblique incidence and mask corner rounding effects for the 32nm node

M. Saied, F. Foussadier, J. Belledent, Y. Trouiller, I. Schanen

Society of Photo-optical Instrumentation Engineers
12 Conference Proceedings Process window OPC verification: dry versus immersion lithography for the 65 nm node [6154-169]

Borjon, A., Belledent, J., Trouiller, Y., Lucas, K., Couderc, C., Sundermann, F., Urbani, J. C., Rody, Y., Gardin, G., …

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12