Strategies of optical proximity correction dedicated to chromeless phase lithography for 65 and 45 nm node

Strategies of optical proximity correction dedicated to chromeless phase lithography for 65 and 45 nm node

Author(s):

Winkler, T. ( Infineon Technologies AG (Germany) )

Dettmann, W. ( Infineon Technologies AG (Germany) )

Hennig, M. ( Infineon Technologies Dresden (Germany) )

Koestler, W. ( Infineon Technologies Dresden (Germany) )

Moukara, M. ( Infineon Technologies AG (Germany) )

Thiele, J. ( Infineon Technologies AG (Germany) )

Zeiler, K. ( Infineon Technologies AG (Germany) )

2 more

Publication title:

Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5754

Pub. Year:

2005

Pt.:

1

Page(from):

476

Page(to):

487

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457349 [0819457345]

Language:

English

Call no.:

P63600/5754

Type:

Conference Proceedings

Details

TDL ID:	ZA00014979
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2005 : 18th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2005.03.01-2005.03.04
Note for article:	18th Optical microlithography,1-4 March, 2005, San Jose, California, USA

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