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Second generation fluids for 193 nm immersion lithography

Author(s):
  • Yu, S.-S. ( Taiwan Semiconductor Manufacturing C0., Ltd. (Taiwan) )
  • Lin, B. J. ( Taiwan Semiconductor Manufacturing C0., Ltd. (Taiwan) )
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. Year:
2005
Pt.:
1
Page(from):
427
Page(to):
434
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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