The impact of mask topography on CD control

The impact of mask topography on CD control

Author(s):

Matsuyama, T. ( Nikon Corp. (Japan) )
Nakashima, T. ( Nikon Corp. (Japan) )

Publication title:

Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5754

Pub. Year:

2005

Pt.:

1

Page(from):

395

Page(to):

406

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457349 [0819457345]

Language:

English

Call no.:

P63600/5754

Type:

Conference Proceedings

Details

TDL ID:	ZA00014979
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2005 : 18th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2005.03.01-2005.03.04
Note for article:	18th Optical microlithography,1-4 March, 2005, San Jose, California, USA

Similar Items:

1 Conference Proceedings The impact of scanner model vectorization on optical proximity correction J. K. Tyminski, T. Nakashima, Q. Zhang, T. Matsuyama, K. Lucas SPIE - The International Society of Optical Engineering	7 Conference Proceedings Mask CD uniformity impact during incoming quality control Villa, E., Baracchi, E., Rosenbusch, A., Har-zvi, M.M., Gottlib, G. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Thermal aberration control for low-k1 lithography Y. Uehara, T. Matsuyama, T. Nakashima, Y. Ohmura, T. Ogata, K. Suzuki, N. Tokuda SPIE - The International Society of Optical Engineering	8 Conference Proceedings Impact of EUV light scatter on CD control as a result of mask density changes Krautschik, C.G., Ito, M., Nishiyama, I., Okazaki, S. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Scanner parameter sensitivity analysis for OPE T. Matsuyama, T. Nakashima, T. Fujiwara, Y. Ishii SPIE - The International Society of Optical Engineering	9 Conference Proceedings Study of high NA imaging with polarized illumination Tomoyuki Matsuyama, Toshiharu Nakashima SPIE - The International Society of Optical Engineering
4 Conference Proceedings Impact of Zernike cross-term on linewidth control Nakashima, T., Higashi, K., Hirukawa, S. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Impact of resist blur on MEF, OPC, and CD control Brunner, T.A., Fonseca, C., Seong, N., Burkhardt, M. SPIE - The International Society of Optical Engineering
5 Conference Proceedings An imaging system for extended ArF immersion lithography T. Matsuyama, Y. Ohmura, T. Nakashima, Y. Uehara Society of Photo-optical Instrumentation Engineers	11 Conference Proceedings Studies of high index immersion lithography Y. Ohmura, H. Nagasaka, T. Matsuyama, T. Nakashima, T. Kobayashi Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings The impact of attenuated phase shift mask topography on hyper-NA lithography [5992-36] Mack, C. A., Smith, M. D., Graves, T. SPIE - The International Society of Optical Engineering	12 Conference Proceedings An intelligent imaging system for ArF scanner T. Matsuyama, Y. Ohmura, T. Nakashima, Y. Uehara, T. Ogata Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12