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Era of double exposure in 7O nm node DRAM cell

Author(s):
Lim, C.-M. ( Hynix Semicondvctor Inc. (South Korea) )
Eom, T.-S. ( Hynix Semicondvctor Inc. (South Korea) )
Kim, S.-M. ( Hynix Semicondvctor Inc. (South Korea) )
Bok, C. ( Hynix Semicondvctor Inc. (South Korea) )
Ma, W.-K. ( Hynix Semicondvctor Inc. (South Korea) )
Park, G.-D. ( Hynix Semicondvctor Inc. (South Korea) )
Moon, S.-C. ( Hynix Semicondvctor Inc. (South Korea) )
Kim, J.-W. ( Hynix Semicondvctor Inc. (South Korea) )
3 more
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. Year:
2005
Pt.:
1
Page(from):
368
Page(to):
376
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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