Resist blur and line edge roughness (Invited Paper)
- Author(s):
Zhang, G. ( Texas Instruments Inc. (USA) ) Terry, M. ( Texas Instruments Inc. (USA) ) O'Brien, S. ( Texas Instruments Inc. (USA) ) Soper, R. ( Texas Instruments Inc. (USA) ) Mason, M. ( Texas Instruments Inc. (USA) ) Kim, W. ( Texas Instruments Inc. (USA) ) Wang, C. ( Texas Instruments Inc. (USA) ) Hansen, S. ( ASML (USA) ) Lee, J. ( ASML (USA) ) Ganeshan, J. ( ASML (USA) ) - Publication title:
- Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5754
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 38
- Page(to):
- 52
- Pages:
- 15
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457349 [0819457345]
- Language:
- English
- Call no.:
- P63600/5754
- Type:
- Conference Proceedings
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