Study of 157nm resists with full field exposure tools
- Author(s):
- Hsu, R. H. ( United Microelectronics Corp. (Taiwan) )
- Huang, I. H. ( United Microelectronics Corp. (Taiwan) )
- Lin, L. C. ( United Microelectronics Corp. (Taiwan) )
- Lin, B. S.-M. ( United Microelectronics Corp. (Taiwan) )
- Publication title:
- Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5753(1)
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 572
- Page(to):
- 583
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457332 [0819457337]
- Language:
- English
- Call no.:
- P63600/5753-1
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Reticle inspection optimization for 90-nm and 130-nm technology nodes using a multibeam UV wavelength inspection tool
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
193-nm imaging using a small-field high-resolution imaging resist exposure tool
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Influence of e-beam-induced contamination on the printability of resist structures at 157-nm exposure
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |