A new monocyclic fluoropolymer for 157-nm and 193-nm photoresists
- Author(s):
Houlihan, F. ( AZ Electronic Materials (USA) ) Sakamuri, R. ( AZ Electronic Materials (USA) ) Hamilton, K. ( AZ Electronic Materials (USA) ) Dimerli, A. ( AZ Electronic Materials (USA) ) Rentkiewicz, D. ( AZ Electronic Materials (USA) ) Romano, A. ( AZ Electronic Materials (USA) ) Dammel, R. R. ( AZ Electronic Materials (USA) ) Wei, Y. ( Infineon Technologies (USA) ) Stepanenko, N. ( Infineon Technologies AG (Germany) ) Sebald, M. ( Infineon Technologies AG (Germany) ) Hohle, C. ( Infineon Technologies AG (Germany) ) Conley, W. ( SEMATECH, Inc. (USA) ) Miller, D. ( SEMATECH, Inc. (USA) ) Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Shigematsu, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Kawaguchi, E. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) - Publication title:
- Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5753(1)
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 554
- Page(to):
- 563
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457332 [0819457337]
- Language:
- English
- Call no.:
- P63600/5753-1
- Type:
- Conference Proceedings
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