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The effects of chemical gradients and photoresist composition on lithographically generated line edge roughness

Author(s):
Chapman, G. ( Simon Fraser Univ. (Canada) )
Poon, D. ( Simon Fraser Univ. (Canada) )
Choo, C. ( Simon Fraser Univ. (Canada) )
Tu, Y. ( Simon Fraser Univ. (Canada) )
Dykes, J. ( Simon Fraser Univ. (Canada) )
Wang, J. ( Simon Fraser Univ. (Canada) )
Peng, J. ( Simon Fraser Univ. (Canada) )
Lennard, W. ( The Univ. of Western Ontario (Canada) )
Kavanagh, K. ( Simon Fraser Univ. (Canada) )
4 more
Publication title:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5753(1)
Pub. Year:
2005
Pt.:
1
Page(from):
368
Page(to):
379
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
Language:
English
Call no.:
P63600/5753-1
Type:
Conference Proceedings

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