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Using mesoscale simulation to explore photoresist line edge roughness

Author(s):
  • Washio, Y. ( Tokyo Ohka Kogyo Co., Ltd. (Japan) )
  • Senzaki, T. ( Tokyo Ohka Kogyo Co., Ltd. (Japan) )
  • Masuda, Y. ( Tokyo Ohka Kogyo Co., Ltd. (Japan) )
  • Saito, K. ( Tokyo Ohka Kogyo Co., Ltd. (Japan) )
  • Obiya, H. ( Tokyo Ohka Kogyo Co., Ltd. (Japan) )
Publication title:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5753(1)
Pub. Year:
2005
Pt.:
1
Page(from):
350
Page(to):
360
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
Language:
English
Call no.:
P63600/5753-1
Type:
Conference Proceedings

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