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Understanding quencher mechanisms by considering photoacid-dissociation equilibrium in chemically amplified resists

Author(s):
Itatani, T. ( National Institute of Advanced Science (Japan) )
Gorwadkar, S. ( National Institute of Advanced Science (Japan) )
Shiotani, A. ( National Institute of Advanced Science (Japan) )
Igusa, M. ( Shibaura Institute of Technology (Japan) )
Yonei, K. ( Shibaura Institute of Technology (Japan) )
Maeda, J. ( Tokyo Univ. of Science (Japan) )
Itotani, H. ( PI R&D Co. (Japan) )
2 more
Publication title:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5753(1)
Pub. Year:
2005
Pt.:
1
Page(from):
338
Page(to):
349
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
Language:
English
Call no.:
P63600/5753-1
Type:
Conference Proceedings

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