0.31k1 ArF lithography for 70-nm DRAM
- Author(s):
Chumanov, G. ( Clemson Univ. (USA) ) Evanoff, D. D. Jr. ( Clemson Univ. (USA) ) Luzinov, I. ( Clemson Univ. (USA) ) Klep, V. ( Clemson Univ. (USA) ) Zdryko, B. ( Clemson Univ. (USA) ) Conley, W. ( Freescale Semiconductor, Inc. and SEMATECH, Inc. (USA) ) Zimmerman, P. ( Intel Corp. (USA) and SEMATECH, Inc. (USA) ) - Publication title:
- Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5753(1)
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 230
- Page(to):
- 240
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457332 [0819457337]
- Language:
- English
- Call no.:
- P63600/5753-1
- Type:
- Conference Proceedings
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