A novel post exposure bake technique to improve CD uniformity over product wafers
- Author(s):
Taylor, J. C. ( Univ. of Texas/Austin (USA) ) Shayib, R. ( Univ. of Texas/Austin (USA) ) Goh, S. ( Univ. of Texas/Austin (USA) ) Chambers, C. R. ( Univ. of Texas/Austin (USA) ) Conley, W. ( Freescale Semiconductor, Inc. and SEMATECH, Inc. (USA) ) Lin, S.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) and SEMATECH, Inc. (USA) ) Willson, C. G. ( Univ. of Texas/Austin (USA) ) - Publication title:
- Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5753(1)
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 222
- Page(to):
- 229
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457332 [0819457337]
- Language:
- English
- Call no.:
- P63600/5753-1
- Type:
- Conference Proceedings
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