Contact hole shrink process with novel chemical shrink materials
- Author(s):
Kawamura, D. ( Toshiba Corp. (Japan) ) Takeishi, T. ( Toshiba Corp. (Japan) ) Sho, K. ( Toshiba Corp. (Japan) ) Matsunaga, K. ( Toshiba Corp. (Japan) ) Shibata, N. ( Toshiba I.S. Corp. (Japan) ) Ozawa, K. ( Toshiba Corp. (Japan) ) Shimura, S. ( Tokyo Electron AT Ltd. (Japan) ) Kyoda, H. ( Tokyo Electron Kyushu Ltd. (Japan) ) Kawasaki, T. ( Tokyo Electron AT Ltd. (Japan) ) Ishida, S. ( Tokyo Electron Kyusyu Ltd. (Japan) ) Toshima, T. ( Tokyo Electron Kyusyu Ltd. (Japan) ) Oonishi, Y. ( Toshiba Corp. (Japan) ) Ito, S. ( Toshiba Corp. (Japan) ) - Publication title:
- Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5753(1)
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 206
- Page(to):
- 213
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457332 [0819457337]
- Language:
- English
- Call no.:
- P63600/5753-1
- Type:
- Conference Proceedings
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