Impact of water and top-coats on lithographic performance in 193-nm immersion lithography
- Author(s):
Hiroi, Y. ( Nissan Chemical Industries, Ltd. (Japan) ) Kishioka, T. ( Nissan Chemical Industries, Ltd. (Japan) ) Sakamoto, R. ( Nissan Chemical Industries, Ltd. (Japan) ) Maruyama, D. ( Nissan Chemical Industries, Ltd. (Japan) ) Sakaida, Y. ( Nissan Chemical Industries, Ltd. (Japan) ) Matsumoto, T. ( Nissan Chemical Industries, Ltd. (Japan) ) Nakajima, Y. ( Nissan Chemical Industries, Ltd. (Japan) ) Chon, S. ( Samsung Electronics Co., Ltd. (South Korea) ) Kim, Y. ( Samsung Electronics Co., Ltd. (South Korea) ) Yoon, S. ( Samsung Electronics Co., Ltd. (South Korea) ) Han, S. ( Samsung Electronics Co., Ltd. (South Korea) ) Yoon, E. ( Samsung Electronics Co., Ltd. (South Korea) ) - Publication title:
- Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5753(1)
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 20
- Page(to):
- 30
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457332 [0819457337]
- Language:
- English
- Call no.:
- P63600/5753-1
- Type:
- Conference Proceedings
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