Material design for immersion lithography with high refractive index fluid (HIF)
- Author(s):
Kim, M. ( Hynix Semiconductor Inc. (South Korea) ) Kim, H. ( Hynix Semiconductor Inc. (South Korea) ) Shim, K. ( Hynix Semiconductor Inc. (South Korea) ) Jeon, J. ( Hynix Semiconductor Inc. (South Korea) ) Gil, M. ( Hynix Semiconductor Inc. (South Korea) ) Song, Y. ( Hynix Semiconductor Inc. (South Korea) ) Enomoto, T. ( Nissan Chemical Industries. Ltd. (Japan) ) Sakaguchi, T. ( Nissan Chemical Industries. Ltd. (Japan) ) Nakajima, Y. ( Nissan Chemical Industries. Ltd. (Japan) ) - Publication title:
- Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5753(1)
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 10
- Page(to):
- 19
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457332 [0819457337]
- Language:
- English
- Call no.:
- P63600/5753-1
- Type:
- Conference Proceedings
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