Characterization and modeling of line width roughness (LWR)
- Publication title:
- Metrology, Inspection, and Process Control for Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5752
- Pub. Year:
- 2005
- Page(from):
- 1227
- Page(to):
- 1236
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457325 [0819457329]
- Language:
- English
- Call no.:
- P63600/5752-3
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
2
Conference Proceedings
Depth-of-focus (DOF) and line-width roughness (LWR) performance of novel surface conditioner solutions for immersion lithography
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Line width roughness (LWR) performance of novel surface conditioner solutions for immersion lithography
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Fractal dimension of line width roughness and its effects on transistor performance
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |