Measurement of deep silicon trench profile using normal incidence optical CD metrology

Measurement of deep silicon trench profile using normal incidence optical CD metrology

Publication title:: Metrology, Inspection, and Process Control for Microlithography XIX
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 5752
Pub. Year:: 2005
Page(from):: 1152
Page(to):: 1160
Pages:: 9
Pub. info.:: Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819457325 [0819457329]
Language:: English
Call no.:: P63600/5752-3
Type:: Conference Proceedings

Details

TDL ID:	ZA00014976
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2005 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2005.02.28-2005.03.03

Similar Items:

1 Conference Proceedings Photomask ADI, AEI, and QA measurements using normal incidence optical CD metrology Apak, E., Sarathy, T.P., McGahan, W.A., Rovira, P.I., Hoobler, R.J. SPIE - The International Society of Optical Engineering	7 Conference Proceedings CD and profile metrology of EUV masks using scatterometry based optical digital profilometry [6349-92] Cho, S., Yedur, S., Kwon, M., Tabet, M. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Line-profile and critical-dimension correlation between a normal-incidence optical CD metrology system and SEM Yang, W., Lowe-Webb, R., Korlahalli, R., Zhuang, V.G., Sasano, H., Liu, W., Mui, D. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Optical metrology of thin films using high-accuracy spectrophotometric measurements with oblique angles of incidence Nevas, S., Manoocheri, F., Ikonen, E., Tikhonravov, A.V., Kokarev, M.A., Trubetskov, M.K. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Metrology of deep trench etched memory structures using 3D scatterometry SPIE - The International Society of Optical Engineering	9 Conference Proceedings CD metrology on OPC features using light optical and electron optical tools Schaetz,T., Doebereiner,S., Scheuring,G., Brueck,H.-J. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Metrology of deep trench structures in DRAM using FTIR reflectance spectrum C. Zhang, S. Liu, T. Shi Society of Photo-optical Instrumentation Engineers	10 Conference Proceedings Production control of shallow trench isolation (STI) at the 130-nm node using spectroscopic ellipsometry-based profile metrology Peters, R.M., Chiao, R.H., Eckert, T., Labra, R., Nappa, D., Tang, S., Washington, J. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Surface profile measurement using a CD optical pickup head Zhong, Z.W., Tham, W.W. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Testing of glancing incidence mirrors using sampled profile measurements Church,E.L., Takacs,P.Z. SPIE - The International Society for Optical Engineering
6 Conference Proceedings Scatterometry based CD and profile metrology of chrome-less masks using optical digital profilometry [6283-111] Lee, K., Yedur, S., Cheng, W., Tovassoli, M., Baik, K. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Linearity improvement for CD metrology with deep UV microscope Yamane, T., Hirano, T. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12