Flexible alignment mark design applications using a next generation phase grating alignment system

Flexible alignment mark design applications using a next generation phase grating alignment system

Author(s):

Darwin, M. ( Rudolph Technologies (USA) )
Kinikoglu, P. ( Rudolph Technologies (USA) )
Liu, Y. ( Rudolph Technologies (USA) )
Dawin, K. ( Rudolph Technologies (USA) )
Clerico, J. ( Rudolph Technologies (USA) )

Publication title:

Metrology, Inspection, and Process Control for Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5752

Pub. Year:

2005

Page(from):

363

Page(to):

374

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457325 [0819457329]

Language:

English

Call no.:

P63600/5752-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00014974
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	2005 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2005.02.28-2005.03.03

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