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Automated CD SEM tilt-ready for primetime: a fast in-line methodology for differentiating lines vs. spaces

Author(s):
Choi, Y.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Sung, M.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, J.-H. ( SungKyunKwan Univ. (South Korea) )
Park, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Choi, I.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Moon, S.-Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
4 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5752
Pub. Year:
2005
Page(from):
351
Page(to):
362
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457325 [0819457329]
Language:
English
Call no.:
P63600/5752-1
Type:
Conference Proceedings

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