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Immersion scatterometry for improved feature resolution and high speed acquisition of resist profiles

Author(s):
Redmond, S. ( Hewiett Packard Co. (USA) )
Weller, R. ( Hewiett Packard Co. (USA) )
Tomasco, R. ( Hewiett Packard Co. (USA) )
Keese, B. ( Hewiett Packard Co. (USA) )
Spaniola, N. ( Hewiett Packard Co. (USA) )
Maeda, T. ( Hitachi High-Technologies Corp. (Japan) )
Takenouchi, K. ( Hitachi High-Technologies Corp. (Japan) )
Page, L. ( Hitachi High Technologies America, Inc. (USA) )
Danilevsky, A. ( Hitachi High Technologies America, Inc. (USA) )
Williams, R. ( Hitachi High Technologies America, Inc. (USA) )
Berger, D. ( Hitachi High Technologies America, Inc. (USA) )
Ward, B. ( Hitachi High Technologies America, Inc. (USA) )
7 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5752
Pub. Year:
2005
Page(from):
237
Page(to):
247
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457325 [0819457329]
Language:
English
Call no.:
P63600/5752-1
Type:
Conference Proceedings

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