AFM measurement of linewidth with sub-nanometer scale precision

AFM measurement of linewidth with sub-nanometer scale precision

Author(s):

Tseng, H. T. ( United Microelectronics Corp. (Taiwan) )

Lin, L.-C. ( United Microelectronics Corp. (Taiwan) )

Huang, I. H. ( United Microelectronics Corp. (Taiwan) )

Lin, B. S.-M. ( United Microelectronics Corp. (Taiwan) )

Huang, C.-C. K. ( KLA-Tencor Corp. (USA) )

Huang, C.-J. ( KLA-Tencor Corp. (USA) )

1 more

Publication title:

Metrology, Inspection, and Process Control for Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5752

Pub. Year:

2005

Page(from):

156

Page(to):

162

Pages:

7

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457325 [0819457329]

Language:

English

Call no.:

P63600/5752-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00014974
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	2005 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2005.02.28-2005.03.03

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